40 CFR Table 7
Continuous Compliance with Emission Limits
June 9, 2020
As stated in §63.9810, you must show continuous compliance with the emission limits for affected sources according to the following table:
Open Table
| For . . . | For the following emission limit . . . | You must demonstrate continuous compliance by . . . |
|---|---|---|
| 1. Each affected source listed in Table 1 to this subpart | a. Each applicable emission limit listed in Table 1 to this subpart | i. Collecting and recording the monitoring and process data listed in Table 2 (operating limits) to this subpart; and |
| ii. Reducing the monitoring and process data associated with the operating limits specified in Table 2 to this subpart; and | ||
| iii. Recording the results of any control device inspections; and | ||
| iv. Reporting, in accordance with §63.9814(e), any deviation from the applicable operating limits specified in Table 2 to this subpart. | ||
| 2. Each new or existing curing oven, shape dryer, and kiln that is used to process refractory products that use organic HAP; each new or existing coking oven and defumer that is used to produce pitch-impregnated refractory products; each new shape preheater that is used to produce pitch-impregnated refractory products; AND each new or existing process unit that is exhausted to a thermal or catalytic oxidizer that also controls emissions from an affected shape preheater or pitch working tank | As specified in items 3 though 7 of this table | Satisfying the applicable requirements specified in items 3 through 7 of this table. |
| 3. Each affected process unit that is equipped with a thermal or catalytic oxidizer | a. The average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen; OR the average THC percentage reduction must equal or exceed 95 percent | i. Collecting the applicable data measured by the control device temperature monitoring system, as specified in items 5, 6, 8, and 9 of Table 8 to this subpart; and ii. Reducing the applicable data measured by the control device temperature monitoring system, as specified in items 5, 6, 8, and 9 of Table 8 to this subpart; and |
| iii. Maintaining the average control device operating temperature for the applicable averaging period specified in items 5, 6, 8, and 9 of Table 2 to this subpart at or above the minimum allowable operating temperature established during the most recent performance test. | ||
| 4. Each affected process unit that is equipped with a control device other than a thermal or catalytic oxidizer | The average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen; OR the average THC performance reduction must equal or exceed 95 percent | Operating and maintaining a THC CEMS at the outlet of the control device or in the stack of the affected source, according to the requirements of Procedure 1 of 40 CFR part 60, appendix F. |
| 5. Each affected process unit that uses process changes to meet the applicable emission limit | The average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen | Operating and maintaining a THC CEMS at the outlet of the control device or in the stack of the affected source, according to the requirements of Procedure 1 of 40 CFR part 60, appendix F. |
| 6. Each affected continuous process unit | The average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen; OR the average THC percentage reduction must equal or exceed 95 percent | Recording the organic HAP processing rate (pounds per hour) and the operating temperature of the affected source, as specified in items 3.b. and 3.c. of Table 4 to this subpart. |
| 7. Each affected batch process unit | The average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen; OR the average THC percentage reduction must equal or exceed 95 percent | Recording the organic HAP processing rate (pounds per batch); and process cycle time for each batch cycle; and hourly average operating temperature of the affected source, as specified in items 8.b. through 8.d. of Table 4 to this subpart. |
| 8. Each kiln that is used to process clay refractory products | As specified in items 9 through 11 of this table | Satisfying the applicable requirements specified in items 9 through 11 of this table. |
| 9. Each affected kiln that is equipped with a DLA | a. The average HF emissions must not exceed 0.019 kg/Mg (0.038 lb/ton) of uncalcined clay processed, OR the average uncontrolled HF emissions must be reduced by at least 90 percent; and b. The average HCl emissions must not exceed 0.091 kg/Mg (0.18 lb/ton) of uncalcined clay processed, or the average uncontrolled HCl emissions must be reduced by at least 30 percent |
i. Maintaining the pressure drop across the DLA at or above the minimum levels established during the most recent performance test; and ii. Verifying that the limestone hopper contains an adequate amount of free-flowing limestone by performing a daily visual check of the limestone in the feed hopper; and iii. Recording the limestone feeder setting daily to verify that the feeder setting is at or above the level established during the most recent performance test; and iv. Using the same grade of limestone as was used during the most recent performance test and maintaining records of the source and grade of limestone. |
| 10. Each affected kiln that is equipped with a DIFF or DLS/FF | a. The average HF emissions must not exceed 0.019 kg/Mg (0.038 lb/ton) of uncalcined clay processed; OR the average uncontrolled HF emissions must be reduced by at least 90 percent; and | i. Verifying at least once each 8-hour shift that lime is free-flowing by means of a visual check, checking the output of a load cell, carrier gas/lime flow indicator, or carrier gas pressure drop measurement system; and |
| b. The average HCl emissions must not exceed 0.091 kg/Mg (0.18 lb/ton) of uncalcined clay processed; OR the average uncontrolled HCl emissions must be reduced by at least 30 percent | ii. Recording feeder setting daily to verify that the feeder setting is at or above the level established during the most recent performance test; and | |
| iii. Initiating corrective action within 1 hour of a bag leak detection system alarm AND completing corrective actions in accordance with the OM&M plan, AND operating and maintaining the fabric filter such that the alarm does not engage for more than 5 percent of the total operating time in a 6-month block reporting period. | ||
| 11. Each affected kiln that is equipped with a wet scrubber | a. The average HF emissions must not exceed 0.019 kg/Mg (0.038 lb/ton) of uncalcined clay processed; OR the average uncontrolled HF emissions must be reduced by at least 90 percent; and | i. Maintaining the pressure drop across the scrubber, liquid pH, and liquid flow rate at or above the minimum levels established during the most recent performance test; and |
| b. The average HCl emissions must not exceed 0.091 kg/Mg (0.18 lb/ton) of uncalcined clay processed; OR the average uncontrolled HCl emissions must be reduced by at least 30 percent | ii. If chemicals are added to the scrubber liquid, maintaining the average chemical feed rate at or above the minimum chemical feed rate established during the most recent performance test. |
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