40 CFR Table I-6 to Subpart I of Part 98
Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for LCD Manufacturing
June 9, 2020
CFR
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Process type factors Process gas i
CF4 C2F6 CHF3 CH2F2 C3F8 c− C4F8 NF3
Remote
NF3 SF6
Etch 1-Ui 0.6 NA 0.2 NA NA 0.1 NA NA 0.3
Etch BCF4 NA NA 0.07 NA NA 0.009 NA NA NA
Etch BCHF3 NA NA NA NA NA 0.02 NA NA NA
Etch BC2F4 NA NA 0.05 NA NA NA NA NA NA
CVD Chamber Cleaning 1-Ui NA NA NA NA NA NA 0.03 0.3 0.9

Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

[75 FR 74818, Dec. 1, 2010, as amended at 78 FR 68225, Nov. 13, 2013]


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